Rudack, Andrew : rechercher sur Z-Library

Le plus grand référentiel d'articles scientifiques au monde. 70,000,000+ d'articles gratuitement.

Don't use scam websites

Livres
Articles (14)
Les plus populaires
Liste
- Liste
- Tableau

1

3D-interconnect: Visualization of extrusion and voids induced in copper-filled through-silicon vias (TSVs) at various temperatures using X-ray microscopy

LayWai Kong, Andrew C. Rudack, Peter Krueger, Ehrenfried Zschech, Sitaram Arkalgud, A.C. Diebold

Journal:

Microelectronic Engineering

Année:

2012

Langue:

english

Fichier:

PDF, 689 KB

english, 2012

2

Thermally induced void growth in through-silicon vias

Kong, Lay Wai, Lloyd, James R., Rudack, Andrew C., Diebold, Alain C.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2013

Langue:

english

Fichier:

PDF, 2.89 MB

english, 2013

3

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Metrology, Inspection, and Process Control for Microlithography XXIV - IR microscopy as an early electrical yield indicator in bonded wafer pairs used for 3D integration

Rudack, Andrew C., Raymond, Christopher J., Singh, Pratibha, Taylor, J. Christopher, Mashevsky, Vadim

Année:

2010

Langue:

english

Fichier:

PDF, 778 KB

english, 2010

4

Measurement technique developed to evaluate transient EMI in a photo bay

Andrew C. Rudack, Michael Pendley, Larry Levit

Journal:

Journal of Electrostatics

Année:

2002

Langue:

english

Fichier:

PDF, 202 KB

english, 2002

5

[IEEE 2010 21st Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - San Francisco, CA, USA (2010.07.11-2010.07.13)] 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Infrared microscopy for overlay and defect metrology on 3D-interconnect bonded wafers

Rudack, Andrew C., Kong, Lay Wai, Baker, Greg G

Année:

2010

Langue:

english

Fichier:

PDF, 1008 KB

english, 2010

6

[IEEE 2011 22nd Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY, USA (2011.05.16-2011.05.18)] 2011 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - Wafer placement repeatibility and robot speed improvements for bonded wafer stacks used in 3D integration

Rudack, Andrew C., Dailey, Michael

Année:

2011

Langue:

english

Fichier:

PDF, 445 KB

english, 2011

7

[IEEE 2012 IEEE 38th Photovoltaic Specialists Conference (PVSC) - Austin, TX, USA (2012.06.3-2012.06.8)] 2012 38th IEEE Photovoltaic Specialists Conference - Equipment safety standards for semiconductor tools applicable to the photovoltaic industry

Rudack, Andrew C.

Année:

2012

Langue:

english

Fichier:

PDF, 362 KB

english, 2012

8

ECS Transactions [ECS 218th ECS Meeting - Las Vegas, NV (October 10 - October 15, 2010)] - Intercomparison of Methods for Detecting and Characterizing Voids in Bonded Wafer Pairs

Allen, Richard A., Rudack, Andrew, Read, David, Baylies, Winthrop

Année:

2010

Langue:

english

Fichier:

PDF, 238 KB

english, 2010

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - TSOM method for semiconductor metrology

Attota, Ravikiran, Dixson, Ronald G., Kramar, John A., Potzick, James E., Vladár, András E., Bunday, Benjamin, Novak, Erik, Rudack, Andrew, Raymond, Christopher J.

Année:

2011

Langue:

english

Fichier:

PDF, 3.17 MB

english, 2011

10

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Optical Microlithography XV - Mask damage by electrostatic discharge: a reticle printability evaluation

Rudack, Andrew, Levit, Lawrence, Williams, Alvina M., Yen, Anthony

Année:

2002

Langue:

english

Fichier:

PDF, 254 KB

english, 2002

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Inspection and metrology for through-silicon vias and 3D integration

Rudack, Andrew C., Starikov, Alexander

Année:

2012

Langue:

english

Fichier:

PDF, 1.74 MB

english, 2012

12

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - Induced ESD damage on photomasks: a reticle evaluation

Rudack, Andrew C., Pendley, Michael, Gagnon, Patrick, Levit, Lawrence, Kimmel, Kurt R., Staud, Wolfgang

Année:

2003

Langue:

english

Fichier:

PDF, 364 KB

english, 2003

13

Exploring the bacterial assemblages along the human nasal passage

Wos-Oxley, Melissa L., Chaves-Moreno, Diego, Jáuregui, Ruy, Oxley, Andrew P. A., Kaspar, Ursula, Plumeier, Iris, Kahl, Silke, Rudack, Claudia, Becker, Karsten, Pieper, Dietmar H.

Journal:

Environmental Microbiology

Année:

2016

Langue:

english

Fichier:

PDF, 1.56 MB

english, 2016

14

AIP Conference Proceedings [AIP STRESS-INDUCED PHENOMENA IN METALLIZATION: 11th International Workshop - Bad Schandau, (Germany) (12–14 April 2010)] - Sub-imaging Techniques For 3D-Interconnects On Bonded Wafer Pairs

Kong, Lay Wai, Krueger, Peter, Zschech, Ehrenfried, Rudack, Andrew C., Arkalgud, Sitaram, Diebold, Alain C., Zschech, Ehrenfried, Ogawa, Shinichi, Ho, Paul S.

Année:

2010

Langue:

english

Fichier:

PDF, 5.09 MB

english, 2010